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Novel dielectric capping layer approach for advanced copper interconnects using chemical grafting

Abstract : Due to its low bulk resistivity copper has become the material of choice for ULSI interconnects. However its high diffusivity in dielectrics and weak chemical bonding to low-k materials require a capping layer as diffusion barrier and to improve adhesion. In order to control the copper-capping layer interface and reduce the risk for electromigration, this paper presents a novel approach in which a dielectric capping layer was chemically grafted on copper lines prior to SiC(N) deposition. Selection of chemically graftable precursors consisted into compatibility tests of these precursors with both layers using adhesion measurements. The robustness to the SiC(N) deposition process was validated by exposing as-deposited films to reducing chemistry plasma at high temperature. Improved copper-capping layer interface quality is demonstrated by the enhancement of the interface adhesion energy on a 500 nm Cu/chemical grafting/40 nm SiN stack. Validation tests also included electrical measurements on two selected precursors.
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https://hal-mines-paristech.archives-ouvertes.fr/hal-00510652
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Submitted on : Friday, August 20, 2010 - 10:25:50 AM
Last modification on : Thursday, September 24, 2020 - 5:22:54 PM

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Isabelle Bispo, Benoit Couturier, P.H. Haumesser, P. Mangiagalli, Hervé Monchoix, et al.. Novel dielectric capping layer approach for advanced copper interconnects using chemical grafting. Microelectronic Engineering, Elsevier, 2006, 83 (11-12), pp.Pages 2088-2093. ⟨10.1016/j.mee.2006.09.033⟩. ⟨hal-00510652⟩

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