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Journal articles
Novel Mechanisms for Augmenting Diabetic Wound Healing
D. Knobel
1
J.L. Crawford
1
P. D. Nguyen
1
J. Tutela
1
V.D. Thanik
1
Jean-Claude Klein
1, 2
O. Eydlin
1
O. Cohen
1
E.H. Davidson
1
J.P. Levine
1
E.H. Davidson 1
Author
J.P. Levine 1
Author
1
NYU Institute of Reconstructive Plastic Surgery (New York, NY - United States)
- NYU - New York University [New York] (70 Washington Square South, New York, NY 10012 - United States)
- NYU - NYU System (United States)
2
CMM - Centre de Morphologie Mathématique (35 rue Saint-Honoré 77305 Fontainebleau cedex - France)
- MINES ParisTech - École nationale supérieure des mines de Paris (60, boulevard Saint-Michel 75006 Paris - France)
- PSL - Université Paris sciences et lettres (60 rue Mazarine 75006 Paris - France)
Abstract : Impaired diabetic wound healing is multi-factorial and incompletely understood. Reactive oxygen species (ROS) and p53, a master gene regulator, are upregulated in diabetic wounds. We have demonstrated improved diabetic wound healing through a novel topical p53 silencing system. We hypothesized that topical silencing of p53 improves diabetic wound healing through a decrease in ROS.
Document type :
Journal articles
Domain :
Complete list of metadata
https://hal-mines-paristech.archives-ouvertes.fr/hal-00836604
Contributor : Sylvie Lavigne Connect in order to contact the contributor
Submitted on : Friday, June 21, 2013 - 11:07:46 AM
Last modification on : Wednesday, November 17, 2021 - 12:27:10 PM
Contributor : Sylvie Lavigne Connect in order to contact the contributor
Submitted on : Friday, June 21, 2013 - 11:07:46 AM
Last modification on : Wednesday, November 17, 2021 - 12:27:10 PM
Identifiers
- HAL Id : hal-00836604, version 1
- DOI : 10.1016/j.jss.2009.11.416
Collections
ENSMP | ENSMP_CMM | PARISTECH | INSTITUT-TELECOM | PSL
Citation
D. Knobel, J.L. Crawford, P. D. Nguyen, J. Tutela, V.D. Thanik, et al.. Novel Mechanisms for Augmenting Diabetic Wound Healing. Journal of Surgical Research, Elsevier, 2010, 158 (2), pp.322. ⟨10.1016/j.jss.2009.11.416⟩. ⟨hal-00836604⟩
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