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Recent progresses in the development of advanced chemical reactors using plasma-based processes

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https://hal-mines-paristech.archives-ouvertes.fr/hal-01981562
Contributor : Magalie Prudon <>
Submitted on : Tuesday, January 15, 2019 - 10:37:28 AM
Last modification on : Thursday, September 24, 2020 - 5:20:18 PM

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  • HAL Id : hal-01981562, version 1

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François Cauneau. Recent progresses in the development of advanced chemical reactors using plasma-based processes. 3rd International Academic Development Workshop of SJTU ParisTech, Shanghai Jiao Tong University, May 2018, shangai, China. ⟨hal-01981562⟩

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