Recent progresses in the development of advanced chemical reactors using plasma-based processes - Mines Paris Accéder directement au contenu
Communication Dans Un Congrès Année : 2018

Recent progresses in the development of advanced chemical reactors using plasma-based processes

Fichier non déposé

Dates et versions

hal-01981562 , version 1 (15-01-2019)

Identifiants

  • HAL Id : hal-01981562 , version 1

Citer

François Cauneau. Recent progresses in the development of advanced chemical reactors using plasma-based processes. 3rd International Academic Development Workshop of SJTU ParisTech, Shanghai Jiao Tong University, May 2018, shangai, China. ⟨hal-01981562⟩
23 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More